| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus which applies a desired angular intensity distribution to a radiation beam by using an array of mirrors, this radiation beam overcoming or alleviating one or more shortcomings of a lithographic apparatus used for projecting a pattern onto a target part of a substrate. <P>SOLUTION: A lithographic apparatus conditions a radiation beam using an illumination system. In the conditioning step, an array of individually controllable elements and associated optical components of the illumination system are controlled so that the radiation beam is converted into a desired illumination mode. This controlling step allocates different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme selected for providing a desired modification of one or more properties of the illumination mode, the radiation beam or both. Furthermore, the lithographic apparatus patterns the radiation beam to have a pattern in its cross-section, and projects the patterned radiation beam onto a target part of a substrate. <P>COPYRIGHT: (C)2011,JPO&INPIT |
