| 摘要 |
<P>PROBLEM TO BE SOLVED: To alleviate errors of a pattern feature given to a substrate. <P>SOLUTION: A lithography method includes steps of: controlling a phase adjuster of a lithography device such that the phase adjustor is constructed and configured so as to adjust the phase of an electric field of a radiation beam passing through an optical element of the phase adjustor; and controlling the signal producing actual time-temperature characteristics of the optical element part such that control is made according to desired time-temperature characteristics of the optical element part, the control of the signal being such that changes in the actual time-temperature characteristics precede changes related to the desired time-temperature characteristics. <P>COPYRIGHT: (C)2011,JPO&INPIT |
