发明名称 THIN FILM TRANSISTOR USING OXIDE SEMICONDUCTOR, AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a thin film transistor, using the oxide semiconductor, which is excellent in off characteristics and carrier mobility, and has high quality, and to provide a method of manufacturing the same. SOLUTION: The thin film transistor has a source electrode, a drain electrode, a gate electrode, a gate insulating film, and an active layer consisting of an oxide semiconductor. Then a buffer layer made of carbon is provided between the active layer and source electrode, and the active layer and drain electrode. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011108882(A) 申请公布日期 2011.06.02
申请号 JP20090263054 申请日期 2009.11.18
申请人 MITSUI MINING & SMELTING CO LTD 发明人 MATSUURA NOBUNORI
分类号 H01L29/786;C23C14/06;H01L21/205;H01L21/28;H01L21/336;H01L21/363;H01L29/417 主分类号 H01L29/786
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