发明名称 METHOD FOR EVALUATING PATTERN SHAPE AND ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus of calculating and evaluating the level of roughness actually present in a pattern, for precisely and quickly evaluating the level of edge roughness from a SEM observation image of a fine line pattern having many noises, by calculating contribution of random noise of the apparatus on the basis of image data of one image and subtracting the roughness originated in the apparatus from a measurement value of an edge roughness index, from among the measured edge roughness indexes. SOLUTION: A quantity (or dispersion value) of fluctuation of edge position due to random noise is expected to be reduced statistically to 1/N when N edge position data items are averaged. Using this property, the single page image is averaged in a vertical direction with various values of parameter S, and then the edge roughness index is calculated. The S-dependence of the edge roughness index is analyzed and a term of a dispersion value directly proportional to 1/S is determined to be due to noise. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011107166(A) 申请公布日期 2011.06.02
申请号 JP20110048474 申请日期 2011.03.07
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 YAMAGUCHI ATSUKO;FUKUDA HIROSHI;KOMURO OSAMU;KAWADA HIROKI
分类号 G01B15/04;G01B15/00 主分类号 G01B15/04
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