发明名称 |
VERTICAL FILM FORMATION APPARATUS, METHOD FOR USING SAME, AND STORAGE MEDIUM |
摘要 |
PURPOSE: A vertical film forming device, a using method thereof, and a storage medium are provided to reduce the Na density of SiN product layer by trapping Na in a coating layer by Cl. CONSTITUTION: A coating layer is coated on the inner wall of a process container(1). A holding member with a process agent forms a preset film on a target in the process container. First and second process gas is supplied to the process container without a plasma process in a coating process. The first and second process gas is supplied to the process container with a plasma process in a film forming process.
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申请公布号 |
KR20110059539(A) |
申请公布日期 |
2011.06.02 |
申请号 |
KR20100116850 |
申请日期 |
2010.11.23 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MATSUNAGA MASANOBU;CHOU PAO HWA;YONEZAWA MASATO;HASEGAWA MASAYUKI;HASEBE KAZUHIDE |
分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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