发明名称 VERTICAL FILM FORMATION APPARATUS, METHOD FOR USING SAME, AND STORAGE MEDIUM
摘要 PURPOSE: A vertical film forming device, a using method thereof, and a storage medium are provided to reduce the Na density of SiN product layer by trapping Na in a coating layer by Cl. CONSTITUTION: A coating layer is coated on the inner wall of a process container(1). A holding member with a process agent forms a preset film on a target in the process container. First and second process gas is supplied to the process container without a plasma process in a coating process. The first and second process gas is supplied to the process container with a plasma process in a film forming process.
申请公布号 KR20110059539(A) 申请公布日期 2011.06.02
申请号 KR20100116850 申请日期 2010.11.23
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUNAGA MASANOBU;CHOU PAO HWA;YONEZAWA MASATO;HASEGAWA MASAYUKI;HASEBE KAZUHIDE
分类号 H01L21/205 主分类号 H01L21/205
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