| 摘要 |
<p>PURPOSE: A polymer for protective layer of resist is provided to ensure excellent productivity and little defects by controlling a receding angle and an advancing angle. CONSTITUTION: A polymer for protective layer of resist comprises: a first repeating unit represented by chemical formula 1; and a second repeating unit containing at least one of repeating units represented by chemical formulas 2-6. In chemical formula 1, R1 is hydrogen, fluorine, or substituted or unsubstituted alkyl group; R2 is hydrogen, or substituted or unsubstituted alkyl group; R3 and R4 are the same or different and represent hydrogen, fluorine, and substituted or unsubstituted alkyl group; R5-R6 are the same or different and represent hydrogen or fluoroalkyl; R7 is OH or SH; and a is an integer of 0-10.</p> |
