PHOTO MASK, METHOD OF MANUFACTURING THE SAME AND METHOD OF FABRICATING ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME

摘要

PURPOSE: A photo mask, manufacturing method thereof, and manufacturing method of an array substrate for a liquid crystal display device using the same are provided to form a gate line using a photo mask, thereby preventing the blurring of the screen of the liquid crystal display device. CONSTITUTION: A photo mask(110) includes a first side(110a) in parallel with a first direction and a second side(110b) shorter than the first side. An electron beam(120) scans and exposes the photo mask in the first direction to record pattern data in a photo resist layer of the photo mask. mth to (m+3)th gate lines are separated on a first substrate(130). A data line crosses the mth to (m+3)th gate lines to define first to fourth pixel areas. A gate insulating film is placed on a gate electrode so that a semiconductor layer is formed.