APPARATUS FOR PROCESSING A SUBSTRATE

摘要

PURPOSE: A substrate processing apparatus is provided to close the discharging holes of supplementary nozzles by a drain cup when chemical liquid is sprayed onto a substrate, thereby preventing the chemical liquid from being supplied onto the substrate wherein the chemical liquid remains in the supplementary nozzles. CONSTITUTION: A rotation chuck(110) rotates a substrate. A plurality of nozzles(120) sprays chemical liquid onto the substrate. A drain cup(130) collects chemical liquid dropped on the substrate wherein the chemical liquid remains in a first discharging hole(122a) and a second discharging hole(124a). A drain pipe(140) discharges the collected chemical liquid. A first driving unit(150) includes a cylinder(152) and a rod(154).