<p>PURPOSE: A device and method for processing various kinds of spices using plasma immersion ions are provided to efficiently polish a surface of large cylindrical processing materials by colliding ions accelerated to a sheath with rotary processing materials. CONSTITUTION: Plasma is filled in a vacuum chamber. A support(12) and a rotation device(13) are installed in a vacuum chamber. A cover(15) includes a slot(14) arranged along the surface of the processing materials. The cover is electrically connected to the processing materials. A power source(16) supplies power to the processing materials and the cover.</p>
申请公布号
KR20110057295(A)
申请公布日期
2011.06.01
申请号
KR20090113633
申请日期
2009.11.24
申请人
KOREA ELECTROTECHNOLOGY RESEARCH INSTITUTE
发明人
CHUNG, SUNG IL;OH, HYUN SEOK;S.A. NIKI FOROV;KIM, PAN KYEOM;KIM, HYEON TAEG;JEON, JEONG WOO;KIM, JONG MOON