SnO2-BASED SPUTTERING TARGET AND SPUTTERED FILM,申请号KR20087020430-传众专利搜索

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发明名称	SnO2-BASED SPUTTERING TARGET AND SPUTTERED FILM
摘要
申请公布号	KR101038244(B1)	申请公布日期	2011.06.01
申请号	KR20087020430	申请日期	2008.03.24
申请人		发明人
分类号	C23C14/34;C04B35/457;C23C14/08;H01B5/14	主分类号	C23C14/34
代理机构		代理人
主权项
地址

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