BLANKMASK, METHOD OF FABRICATING THE SAME AND METHOD OF FABRICATING PHOTOMASK USING THE SAME

摘要

PURPOSE: A blank mask and manufacturing method thereof, and method for manufacturing a photo mask using the same are provided to form a middle layer between a metal film and a resist film wherein the middle layer prevents ion spreading, thereby suppressing an acid neutralization reaction between the resist film and the metal film when the blank mask is exposed to light. CONSTITUTION: A metal film(20) is formed on a transparent substrate(11). The first layer film(21) and the second layer film(22) of the metal film essentially include molybdenum and silicon. A middle layer is formed on the metal film. The middle layer prevents ion spreading. A resist film is formed on the middle layer.