| 摘要 |
<p>The present invention provides a motherboard having panel substrates efficiently arranged thereon and a reduced wasted substrate region, a method for producing the motherboard, and a device substrate comprising the panel substrates formed on the motherboard. The motherboard of the present invention comprises a plurality of panel substrates, wherein the motherboard has a silicon thin film formed on a principal surface thereof, each of the panel substrates has a transistor forming region and a marginal region, the transistor forming region is formed by polycrystallizing the silicon thin film, the marginal region is provided on an outer edge of each of the panel substrates, and at least one of the panel substrates has the marginal region including a region with a silicon thin film which has a crystal profile different from a crystal profile of a silicon thin film in the transistor forming region.</p> |
