| 摘要 |
<p>PURPOSE: An apparatus and method for processing a substrate is provided to eliminate a process of transferring a substrate between a coating process and a decompression drying process, thereby shortening processing time. CONSTITUTION: A coating unit(100) coats a photosensitive solution onto a substrate(11). The coating unit comprises a processing chamber(110), a substrate supporting member(120), and a coating nozzle member(130). The substrate supporting member comprises a stage, a first vacuum line(125), and a first vacuum pump(126). An exhaust hole(124) is formed on the stage. A decompression drying unit(200) decompresses and dries the coated photosensitive solution.</p> |
