发明名称 |
OXIDE SINTERED COMPACT FOR PRODUCING TRANSPARENT CONDUCTIVE FILM |
摘要 |
<p>The present invention provides an ITO amorphous transparent conductive film used in a display electrode for a flat panel display or the like, which can be produced without heating a substrate and without feeding water during the sputtering, while achieving both high etchability and lower resistivity at high levels. An oxide sintered compact containing indium oxide as a main component, while containing one or more elements selected from nickel, manganese, aluminum and germanium as a first additive element, with the total content of the first additive element being 2-12 atom % relative to the total content of indium and the first additive element.</p> |
申请公布号 |
EP2327673(A1) |
申请公布日期 |
2011.06.01 |
申请号 |
EP20090816131 |
申请日期 |
2009.09.18 |
申请人 |
JX NIPPON MINING & METALS CORPORATION |
发明人 |
IKISAWA, MASAKATSU;YAHAGI, MASATAKA |
分类号 |
C04B35/00;C23C14/08;H01B1/08;H01B5/14;H01B13/00 |
主分类号 |
C04B35/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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