VERTICALLY ADJUSTABLE CHEMICAL MECHANICAL POLISHING HEAD HAVING A PIVOT MECHANISM AND METHOD FOR USE THEREOF

摘要

PURPOSE: A vertically adjustable chemical mechanical polishing head with a pivot machine and a method for using the same are provided to eliminate vertical ununiformity on the surface of a substrate by a mechanical buffing combination, thereby forming an extremely flat surface. CONSTITUTION: A retaining ring(220) holds a substrate during a CMP. The retaining ring is combined with an upper housing(215) through a retaining ring adapter(225). A drive flange(240) includes a lower surface coupled with a dome(255) by a ball bearing(250). The dome is coupled with a base flange. The base flange is combined with a sub carrier(260) and a rubber insert(210).