APPRATUS FOR TREATING SUBSTRATE

摘要

PURPOSE: An apparatus for treating a substrate is provided to supply a reaction gas to a reaction chamber evenly by installing a gas injection unit including first and second injection nozzles. CONSTITUTION: In an apparatus for treating a substrate, a reaction chamber(112) offers a reaction space which is formed by a body(112b) and a lid(112a). A plurality of plasma source electrodes(114) are formed on the lid corresponding to reaction space. A plurality of protrusions(134) are formed on the lid between a plurality of plasma source electrodes. A feeding line(118) is connected to a plurality of plasma source electrodes. A gas injection unit(124) is installed in a plurality of plasma source electrodes and protrusions.