发明名称 |
Reflective optical element and EUV lithography appliance |
摘要 |
A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system consisting of at least one layer. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.
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申请公布号 |
US7952797(B2) |
申请公布日期 |
2011.05.31 |
申请号 |
US20090399775 |
申请日期 |
2009.03.06 |
申请人 |
CARL ZEISS SMT GMBH |
发明人 |
TRENKLER JOHANN;MANN HANS-JUERGEN;NOTHELFER UDO |
分类号 |
F21V9/06;G03F7/20;G21K1/06 |
主分类号 |
F21V9/06 |
代理机构 |
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