| 摘要 |
Disclosed herein are embodiments of a deep trench capacitor structure and a method of forming the structure that incorporates a buried capacitor plate contact that is simultaneously formed using an adjacent deep trench. This configuration eliminates the need for additional photolithographic processing, thereby, optimizing process windows. This configuration further eliminates the need to form the deep trench capacitor through an N-doped diffusion region connector and, thereby, allows for greater design flexibility when connecting the deep trench capacitor to another integrated circuit structure (e.g., a memory cell or decoupling capacitor array). Also, disclosed herein are embodiments of another integrated circuit structure and method, and more specifically, a memory cell (e.g., a static random access memory (SRAM) cell)) and method of forming the memory cell that incorporates one or more of these deep trench capacitors in order to minimize or eliminate soft errors.
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