发明名称 Stage apparatus, exposure apparatus, and device manufacturing method
摘要 A stage apparatus that includes a stage and moves the stage in at least a first direction. The stage apparatus also includes a plurality of holding units fixed on the stage to extend in the first direction, in which the first direction is a longitudinal direction. Each of the holding units includes a first portion. A second portion is arranged between the first portion and the stage and a third portion is arranged between the second portion and the stage. The first portion includes a holding surface to hold an object. A length of the second portion in the first direction is less than a length of the first portion in the first direction, and the length of the second portion in the first direction is less than a length of the third portion in the first direction. Ends of the second portion are determined by two slits extending from both ends of the holding units in the first direction towards a central portion of the holding units, and the first portion is connected to the third portion at only one point via the second portion.
申请公布号 US7952686(B2) 申请公布日期 2011.05.31
申请号 US20080060395 申请日期 2008.04.01
申请人 CANON KABUSHIKI KAISHA 发明人 FUJIWARA YASUHIRO
分类号 G03B27/62;G03B27/58 主分类号 G03B27/62
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