Method and Apparatus for Forming Crystallized Semiconductor Layer, and Method for Manufacturing Semiconductor Apparatus,申请号KR20040041566-传众专利搜索

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发明名称	Method and Apparatus for Forming Crystallized Semiconductor Layer, and Method for Manufacturing Semiconductor Apparatus
摘要
申请公布号	KR101037840(B1)	申请公布日期	2011.05.31
申请号	KR20040041566	申请日期	2004.06.03
申请人		发明人
分类号	G02F1/1345;H01L29/786;B23K26/00;G02F1/1368;H01L21/00;H01L21/02;H01L21/20;H01L21/268;H01L21/324;H01L21/335;H01L21/336;H01L29/78	主分类号	G02F1/1345
代理机构		代理人
主权项
地址

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