发明名称 |
SUBSTRATE FOR BLANKMASK, BLANKMASK MANUFACTURED USING THE SAME AND MANUFACTURING METHOD THEREOF |
摘要 |
<p>PURPOSE: A substrate for blankmask, blankmask manufactured using the same and a manufacturing method thereof are provided to implement a blank mask of excellent performance by applying a filter to a ground slurry unit and a discharge unit. CONSTITUTION: In a substrate for blankmask, blankmask manufactured using the same and a manufacturing method thereof, A polishing slurry(200) is provided to the upper part of a polishing device(100) through the slurry supply unit. A grinding particle in a polishing slurry and foreign material are removed by a plurality of filter which is installed in the slurry supply unit. The polishing slurry supplied to the upper part of the polishing device is passed between an upper plate and a lower plate The used polishing slurry is returned into a slurry tank through a slurry discharge unit.</p> |
申请公布号 |
KR20110057064(A) |
申请公布日期 |
2011.05.31 |
申请号 |
KR20100064464 |
申请日期 |
2010.07.05 |
申请人 |
S&STECH CO., LTD. |
发明人 |
NAM, KEE SOO;YANG, SIN JU;YANG, CHUL KYU;LEE, JAE HWAN |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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