| 摘要 |
PURPOSE: A focus ring is provided to implement a high plasma processing apparatus having high shield to resistant plasma and high frequency field. CONSTITUTION: In a focus ring, a multi-layered focus ring(6) is attached on the flange part(5b) and an isolation ring(7). A multi-layered focus ring is formed into a two-layer structure by laminating an upper dielectric and a lower dielectric. The isolation ring is comprised of an inner ring(7a) and an outer ring(7b). A low dielectric substance(6a) is arranged in a base member(5). A plasma-resistance dielectric(6b) is arranged in the process space of the process chamber.
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