| 发明名称 |
Substrate Used in a Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization |
| 摘要 |
A substrate includes an overlay target. The overlay target can include two superposed layers. Each of the two superposed layers includes two gratings with a different pitch from each other.
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| 申请公布号 |
US2011122496(A1) |
申请公布日期 |
2011.05.26 |
| 申请号 |
US201113010424 |
申请日期 |
2011.01.20 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DER SCHAAR MAURITS;DEN BOEF ARIE JEFFREY;MOS EVERHARDUS CORNELIS;KEIJ STEFAN CAROLUS JACOBUS ANTONIUS |
| 分类号 |
G02B5/18 |
主分类号 |
G02B5/18 |
| 代理机构 |
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代理人 |
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| 主权项 |
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