发明名称 EXTENDED UNDER-BUMP METAL LAYER FOR BLOCKING ALPHA PARTICLES IN A SEMICONDUCTOR DEVICE
摘要 An integrated circuit (IC) has an under-bump metal (UBM) pad disposed between a solder bump and a semiconductor portion of the IC. The UBM pad has a contact perimeter formed with the solder bump. The UBM pad extends beyond the contact perimeter a sufficient distance to block alpha particles emitted from the surface of the solder bump from causing an upset event in the semiconductor portion.
申请公布号 US2011121438(A1) 申请公布日期 2011.05.26
申请号 US20090624294 申请日期 2009.11.23
申请人 XILINX, INC. 发明人 HART MICHAEL J.
分类号 H01L23/556;H01L21/66 主分类号 H01L23/556
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