发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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申请公布号 |
US2011122376(A1) |
申请公布日期 |
2011.05.26 |
申请号 |
US20100796482 |
申请日期 |
2010.06.08 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DERKSEN ANTONIUS THEODORUS ANNA MARIA;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;LOF JOERI;LOOPSTRA ERIK ROELOF;MULKENS JOHANNES CATHARINUS HUBERTUS;JANSEN HANS;VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRICUS;STRAAIJER ALEXANDER;STREEFKERK BOB |
分类号 |
G03B27/52;G03B27/60;G03F7/20;G03F9/00 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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