发明名称 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 A wafer (W) is loaded on a wafer stage (WST1) and unloaded from the wafer stage (WST1), using a chuck member (102) which holds the wafer (W) from above in a non-contact manner. Accordingly, members and the like to load/unload the wafer (W) on/from the wafer stage (WST1) do not have to be provided, which can keep the stage from increasing in size and weight. Further, by using the chuck member (102) which holds the wafer (W) from above in a non-contact manner, a thin, flexible wafer can be loaded onto the wafer stage (WST1) as well as unloaded from the wafer stage (WST1) without any problems.
申请公布号 WO2011040646(A3) 申请公布日期 2011.05.26
申请号 WO2010JP67608 申请日期 2010.09.30
申请人 NIKON CORPORATION;ICHINOSE, GO 发明人 ICHINOSE, GO
分类号 G03F7/20;H01L21/683 主分类号 G03F7/20
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