| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device that adjusts light intensity distribution of a radiated beam to irradiate a mask with, and is conducive to properly forming a pattern on a substrate; and to provide an exposure method and method for manufacturing a device. <P>SOLUTION: The exposure device includes: a light source device that has a plasma generation unit for generating plasma, and a focusing optical system for irradiating a side of an illumination optical system with an exposure light emitted from the plasma; a slit device 24 that adjusts the light intensity distribution of the exposure light which the mask is irradiated with; a measurement device 40 that measures an emission state of the exposure light emitted from the light source device; and a control unit 50 that controls the slit device 24 based on a result measured by the measurement device 40. <P>COPYRIGHT: (C)2011,JPO&INPIT |
