Radiation curable mixture, useful e.g. for producing photoresists, obtained by reacting (meth)acrylic acid with ethoxylated glycerin, reacting reaction mixture with aromatic or aliphatic, bifunctional epoxide, and primary or secondary amine

摘要

Radiation curable mixture obtained by: reacting (a) (meth)acrylic acid with glycerin, which is ethoxylated on a statistical average of 2.9-4 times; (b) reacting resulting reaction mixture from (a) with at least one aromatic or aliphatic, at least bifunctional epoxide (up to 40 wt.%); and optionally (c) at least one primary or secondary amine (0-8 wt.%) with the condition that the sum of (a), (b) and (c) is 100 wt.%, is claimed.