发明名称 HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM
摘要 A method of line narrowing for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses includes selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive surface of a dispersive wavelength selection optic; changing the curvature of the dispersive surface in a first manner that includes imparting a catenary curvature to the dispersive surface; and changing the curvature of the dispersive surface in a second manner that includes imparting a cylindrical curvature to the dispersive surface.
申请公布号 US2011122901(A1) 申请公布日期 2011.05.26
申请号 US201113020330 申请日期 2011.02.03
申请人 CYMER, INC. 发明人 SANDSTROM RICHARD L.;PARTLO WILLIAM N.;BROWN DANIEL J.W.
分类号 H01S3/10 主分类号 H01S3/10
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