| 摘要 |
An active matrix substrate (101A) comprises a transparent substrate (10), a transparent wiring (such as LG, LD, LP, L1, and L2) formed on the transparent substrate, a transparent semiconductor layer 44 that covers at least a part of the transparent wiring, and a transparent insulating film (40, 50) that covers at least a part of the wiring and of the transparent semiconductor layer (44). The wiring comprises a main wiring that extends in a row direction and a column direction so as to intersect with each other (such as a part of 41) and a sub-wiring that branches from the main wiring to be connected to elements in a pixel (101a) (such as a part of 41, 42, and 43). The wiring is formed by using a conductive material such as ZTO or ITO.
|
