发明名称 METHODS OF FABRICATING SEMICONDUCTOR STRUCTURES AND DEVICES USING GLASS BONDING LAYERS, AND SEMICONDUCTOR STRUCTURES AND DEVICES FORMED BY SUCH METHODS
摘要 Methods of fabricating semiconductor structures and devices include bonding a seed structure to a substrate using a glass. The seed structure may comprise a crystal of semiconductor material. Thermal treatment of the seed structure bonded to a substrate using a glass may be utilized to control the strain state within the seed structure. The seed structure may be placed in a state of compressive strain at room temperature. The seed structure bonded to the glass may be used for growth of semiconductor material, or, in additional methods, a seed structure may be bonded to a first substrate using a glass, thermally treated to control the strain state within the seed structure and a second substrate may be bonded to an opposite side of the seed structure using a non-glassy material.
申请公布号 WO2011061580(A1) 申请公布日期 2011.05.26
申请号 WO2010IB02542 申请日期 2010.09.24
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES;LETERTRE, FABRICE 发明人 LETERTRE, FABRICE
分类号 H01L21/762 主分类号 H01L21/762
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