PLASMA GENERATOR AND FILM FORMING DEVICE, ETCHING DEVICE, SURFACE TREATMENT DEVICE, AND ION IMPLANTATION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a plasma generator capable of generating lengthy line plasmas with uniformity and a high density; and to provide a film forming device capable of forming film on a large area substrate, an etching device, a surface treatment device, and an ion implantation device, by utilizing the above plasma generator.

SOLUTION: The electron cyclotron resonance line plasma generator includes: a microwave generating source for generating microwaves; a waveguide in which the microwaves generated from the microwave generating source are introduced and which has slits extending in a propagation direction of the microwaves; a chamber to which a plasma generating gas to be made plasmas by microwaves leaking out from the slits through a dielectric window is supplied; and a magnetic field-generating mechanism which applies a magnetic field on the plasma to generate an electron cyclotron resonance in the chamber.

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