| 摘要 |
<p>An imaging optical system (6) of the far pupil type, which is applicable to an exposure apparatus, is provided with six reflecting mirrors (M1 to M6) and forms an image of a first plane (4) on a second plane (7). An incident pupil of the imaging optical system is positioned on a side opposite to the imaging optical system with the first plane intervening therebetween. A condition of -14.3 < (PD/TT)/R < -8.3 is fulfilled by a distance PD which is provided along an optical axis (AX) between the incident pupil and the first plane, a distance TT which is provided along the optical axis between the first plane and the second plane, and an angle of incidence R (rad) of a main light beam which comes into the first plane.</p> |
