| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a simply structured substrate exposure apparatus capable of reducing variations in a gap between a substrate to be exposed and a photomask, at a proximity exposure without having to prepare special peripheral equipment for correcting the deflection, thereby attaining reduction in the variations in the line width and the film thickness of a pattern formed on the substrate to be exposed. <P>SOLUTION: The substrate exposure apparatus is equipped with an exposure stage for holding the substrate to be exposed, on which a photosensitive film is formed, on its upper surface, and a mask holder for holding a photomask (original plate) of a rectangular shape in planar view over the upper surface of the substrate to be exposed, by making the photomask face the substrate to be exposed, for performing pattern exposure from above the substrate to be exposed, and performs pattern exposure to the substrate to be exposed by providing a predetermined proximity gap between the photomask and the substrate to be exposed, and radiating light from above the photomask. The exposure stage has the same deflection amount as that of the photomask. <P>COPYRIGHT: (C)2011,JPO&INPIT |
