发明名称 MEASUREMENT SYSTEM FOR CORRECTING OVERLAY MEASUREMENT ERROR
摘要 A measurement system and a measurement method, which can obtain a measurement value close to a true value considering an overlay measurement error according to a higher order regression analysis model. The measurement system and the measurement method provide a technique for determining optimal positions of shots to be measured using an optimal experimental design. When the regression analysis model and the number of shots to be measured are determined in advance, a method is used for determining an optimal number of shots to be measured according to the regression analysis model and process dispersion using a confidence interval estimating method. A dynamic sampling method is used for dynamically changing the number and positions of shots to be measured according to a change in process features by combining the above two methods. And, when erroneous data is detected, or when measured data is missing, a robust regression analysis method and a technique for filtering the erroneous data and the missing data are used.
申请公布号 US2011125440(A1) 申请公布日期 2011.05.26
申请号 US201113021463 申请日期 2011.02.04
申请人 LEE MOON-SANG;YUM BONG-JIN;KIM HONG-SEOK;KIM KWAN-WOO;KIM SEUNG-HYUN;PARK CHAN-HOON 发明人 LEE MOON-SANG;YUM BONG-JIN;KIM HONG-SEOK;KIM KWAN-WOO;KIM SEUNG-HYUN;PARK CHAN-HOON
分类号 G06F17/18;G06F11/00 主分类号 G06F17/18
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