DEVICE AND METHOD FOR COATING A SUBSTRATE

摘要

The invention relates to a device for coating a substrate, comprising a vacuum chamber, the inside of which is designed to receive the substrate to be coated and at least one sputter target, which is designed to be removed during operation of the device by particle bombardment, wherein at least one window is disposed in the wall of the vacuum chamber. The device further comprises a unit for determining the removal of the sputter target, said unit having a measurement unit for optically measuring the distance between a predeterminable point outside of the vacuum chamber and at least one predeterminable point on the surface of the sputter target, wherein the measurement unit further comprises an evaluation unit, by means of which a parallax offset and/or geometric distortion can be corrected. The invention further relates to a corresponding method.