| 摘要 |
<P>PROBLEM TO BE SOLVED: To align patterns with enough accuracy to each other in an imprint lithography device. <P>SOLUTION: A method of determining an offset between an imprint template 21 and a substrate 20 by using an alignment grating 24 on the imprint template 21 and an alignment grating 23 on the substrate 20 is disclosed. The method includes bringing the imprint template alignment grating 24 and the substrate alignment grating 23 sufficiently close together such that they form a composite grating, guiding an alignment radiation beam to the composite grating while modulating the relative position of the imprint template 21 and the substrate 20, detecting a luminous intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing the modulation of the detected luminous intensity. <P>COPYRIGHT: (C)2011,JPO&INPIT |
