| 发明名称 |
In-Ga-Zn-O-BASED OXIDE SINTERED BODY SPUTTERING TARGET WITH EXCELLENT STABILITY DURING LONG-TERM DEPOSITION |
| 摘要 |
<p>Disclosed is an In-, Zn- and Ga-containing sputtering target comprising an oxide sintered body in which the surface and interior compounds are essentially of the same crystal type.</p> |
| 申请公布号 |
WO2011061938(A1) |
申请公布日期 |
2011.05.26 |
| 申请号 |
WO2010JP06761 |
申请日期 |
2010.11.18 |
| 申请人 |
IDEMITSU KOSAN CO.,LTD.;ITOSE, MASAYUKI;YANO, KOKI |
发明人 |
ITOSE, MASAYUKI;YANO, KOKI |
| 分类号 |
C23C14/34;C04B35/00;H01L21/363 |
主分类号 |
C23C14/34 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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