发明名称 |
Substrate mounting table of substrate processing apparatus |
摘要 |
<p>A substrate mounting table of a substrate processing apparatus includes a base portion and a circular plate-shaped electrostatic chuck adhered to an upper surface of the base portion by an adhesive layer. The electrostatic chuck has a circular attracting surface to support a substrate. The substrate mounting table further includes an annular focus ring arranged around the electrostatic chuck to surround the substrate and to cover an outer peripheral portion of the upper surface of the base portion. The electrostatic chuck has a two-layer structure including an upper circular part and a lower circular part having a diameter larger than that of the upper circular part. An outer peripheral portion of the lower circular part and an outer peripheral portion of the adhesive layer adhering the lower circular part to the base portion are covered with the focus ring.</p> |
申请公布号 |
EP2325877(A2) |
申请公布日期 |
2011.05.25 |
申请号 |
EP20100191516 |
申请日期 |
2010.11.17 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
SATO, TETSUJI;KITAZAWA, TAKASHI;YOSHIMURA, AKIHIRO |
分类号 |
H01L21/683 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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