| 摘要 |
PURPOSE: An apparatus for filtering an etching solution is provided to auxiliary-filter the etching solution in case of the formation of a filter cake and easily replace a filtering unit. CONSTITUTION: An apparatus for filtering an etching solution includes a main body(110), an inlet pipe(120), a first filtering part(113), a second filtering part(130), and an outlet pipe(140). The main body includes a partition wall(111). A first filtering chamber and a second filtering chamber are formed in the partition wall. The inlet pipe is in connection with the first filtering chamber. The first filtering part is arranged at the partition wall and filters an etching solution. The second filtering part is arranged at the second filtering chamber. One end of the outlet pipe is in connection with the second filtering part. Filtered etching solution is discharged through the outlet pipe.
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