| 摘要 |
PURPOSE: A showerhead assembly, a thin film depositing device, and a thin film depositing method using the same are provided to uniformly and quickly deposit a thin film by using an atomic layer depositing method and a chemical vapor depositing method alternatively or together. CONSTITUTION: A showerhead assembly(300) includes a plurality of gas sprayers. The plurality of gas sprayers are radially arranged on the upper side of a susceptor and spray the gas supplied from the outside. A gas sprayer for CVD sprays a plurality of raw gases on the substrate. A plurality of raw material gas sprayers(101,102) sprays the different kinds of gas on the substrate to deposit the thin film with ALD. A purge gas sprayer(103,104) for ALD sprays the purge gas.
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