发明名称 HIGH ABSORBENT STRUCTURE AND MAUNFACTURE METHOD THEREOF
摘要 PURPOSE: A high absorbent structure and a manufacturing method thereof are provided to manufacture the thin and soft high absorbent structure without using a fiber assembly matrix and a high absorbent particle. CONSTITUTION: A manufacturing method of a high absorbent structure comprises the following steps: blending 70~98wt% of polyethylene oxide with the molecular weight of 50,000~500,000 or polyethylene glycol, 1~20wt% of photo initiator, and 1~10wt% of monomer including more than one acryl group, vinyl ether group, or anhydride group; manufacturing a fabric out of the mixture; irradiating ultraviolet rays to the fabric and manufacturing a nonwoven fabric using the fabric.
申请公布号 KR101036664(B1) 申请公布日期 2011.05.25
申请号 KR20090013963 申请日期 2009.02.19
申请人 发明人
分类号 D04H1/4291;D01F1/10;D04H1/732;D06M10/00 主分类号 D04H1/4291
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