| 摘要 |
<p>PURPOSE: An electron beam exposing device is provided to improve the accuracy of an exposing device by absorbing electrons moved by a magnetic field in a ground unit. CONSTITUTION: An electron beam exposing device includes an electron collecting unit(27). The electron collecting unit applies the electrons reflected from the surface of a resist layer and collects the reflected electrons. An electron collecting unit includes a magnetic unit(1,2) and a ground unit(3). The magnetic unit applies a magnetic field to the reflected electrons. The ground unit absorbs the reflected electrons.</p> |
