发明名称 PELLICLE FOR LITHOGRAPHY
摘要 <p>PURPOSE: A lithography pellicle is provided to efficiently and uniformly form an adhesive layer at the inner circumference surface of an atmospheric pressure controlling hole. CONSTITUTION: An inner circumference surface is arranged at an atmospheric pressure controlling hole. The inner circumference surface is opened toward to the inner side of a pellicle frame(3). An adhesive layer is arranged at the inner circumference through a spraying operation. A filter(7) is formed at the outer lateral surface of the pellicle frame in order to cover the atmospheric pressure controlling hole.</p>
申请公布号 KR20110055454(A) 申请公布日期 2011.05.25
申请号 KR20100114838 申请日期 2010.11.18
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 HAMADA YUICHI
分类号 G03F1/62;H01L21/027 主分类号 G03F1/62
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