A DRY CLEANSING APPARATUS

摘要

PURPOSE: A dry cleaning device is provided to reduce working time by simultaneously two kinds of cleaning operations through one process. CONSTITUTION: A substrate chuck(110) fixes a substrate for a cleaning operation. A cleaning head(120) includes an ultrasonic head and an atmospheric pressure plasma head. The cleaning head scans and cleans the upper side of the substrate fixed to the substrate chuck. A head horizontal moving unit(130) horizontally moves the cleaning head from one side to another side of the substrate chuck. The atmospheric pressure plasma head is installed in the front of the atmospheric pressure plasma head and the ultrasonic head is installed on the rear of the atmospheric pressure plasma head. The ultrasonic head includes an ultrasonic spray slit and first and second suction slits.