SUBSTRATE INSPECTING APPARATUS AND OPERATING SYSTEM THEREOF

摘要

PURPOSE: A substrate inspection apparatus and an operation system thereof are provided to inspect defects on a glass substrate and a plastic substrate used for manufacturing a display panel in a manufacturing line. CONSTITUTION: An operation system of a substrate inspection apparatus comprises a normal measurement mode, a one map measurement mode, and a schedule measurement mode. The normal measurement mode measures the first scan to substrates by moving an optical system and scans a measurement area corresponding one substrate. The one map measurement mode finishes the measurement when the measurement area corresponding to one substrate is scanned. The schedule measurement mode performs the measurement at a designed time.