| 摘要 |
PURPOSE: A substrate drying unit, a substrate drying device including the same, and a substrate drying method thereof are provided to improve drying efficiency by removing processing solutions remaining on the substrate twice. CONSTITUTION: A substrate drying unit(102a,102b) includes an air knife(120a,120b) and a heating unit. The air knife firstly removes processing solutions used in a cleaning process. The heating unit secondly removes the firstly removed processing solutions by heating the fine processing solutions of a moisture type remaining on the substrate. The air knife has a body and an outlet(128). The outlet is connected to a flow path and the processing solutions remaining on the substrate by spraying air to the substrate. The heating unit includes a housing and a heater.
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