| 摘要 |
<p>PURPOSE: An exposure device and a method for manufacturing a device using the same are provided to improve the precision of overlap by changing the image forming magnification of a projection optical system. CONSTITUTION: An exposure device(100) includes a projection optical system which projects the pattern of a disc(9) to a substrate(11). The projection optical system includes a first plane mirror(13), a second plane mirror(17), a first optical unit(18), and a second optical unit(21). The first plane mirror and the second plane mirror bend an optical path. The first optical unit is arranged between the object side of the system and the first plane mirror. The second optical unit is arranged between the image side of the system and the second plane mirror.</p> |
