发明名称 ARRANGEMENT FOR GENERATING AN ACTIVE GAS JET
摘要 The invention is directed to an arrangement for generating a chemically active jet by means of a plasma generated by electric discharge in a process gas. It is the object of the invention to find a novel possibility for generating a chemically active jet by means of a plasma generated by electric discharge in which high chemical activity develops at increased process gas velocity of the active gas jet on the surface to be treated and is electrically neutral already at the output of the arrangement, so that it does not pose a threat to the operating personnel, the environment and the treated surface. This object is met according to the invention in that the discharge chamber has a conically narrowed end for increasing the velocity of the active gas jet, and a limiting channel for preventing propagation of the discharge zone into the free space for the surface to be treated is arranged following the narrowed end of the discharge chamber. The limiting channel is essentially cylindrical and is grounded and its length is greater than its cross section by a factor of 5 to 10.
申请公布号 CA2399493(C) 申请公布日期 2011.05.24
申请号 CA20022399493 申请日期 2002.08.22
申请人 TEPLA AG 发明人 KONAVKO, RUDOLPH;KONAVKO, ARKADY;SCHMID, HERMANN
分类号 C23C8/36;H05H1/02;H05H1/30;H05H1/34 主分类号 C23C8/36
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