发明名称 HALOGENATED POLYSILANE AND PLASMA-CHEMICAL PROCESS FOR PRODUCING THE SAME.
摘要 The invention relates to a halogenated polysilane (referred to in the following as polysilane) as a pure compound or as a mixture of compounds and to a plasma-chemical process for producing the same. The polysilane is particularly soluble and fusible and is characterized by significant product signals in special chemical shifts in <sup>29</sup>Si NMR spectra. The process for producing the halogenated polysilane is characterized by using a low hydrogen portion and an especially low power density regarding the plasma discharge, thereby allowing the production of a halogenated polysilane which is particularly soluble.
申请公布号 MX2010013005(A) 申请公布日期 2011.05.24
申请号 MX20100013005 申请日期 2009.05.27
申请人 SPAWNT PRIVATE S.A.R.L. 发明人 CHRISTIAN BAUCH;SEYED-JAVAD MOHSSENI-ALA;RUMEN DELTSCHEW;GERD LIPPOLD;NORBERT AUNER
分类号 B01J12/00;C01B33/107;H05H1/24 主分类号 B01J12/00
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