发明名称 |
HALOGENATED POLYSILANE AND PLASMA-CHEMICAL PROCESS FOR PRODUCING THE SAME. |
摘要 |
The invention relates to a halogenated polysilane (referred to in the following as polysilane) as a pure compound or as a mixture of compounds and to a plasma-chemical process for producing the same. The polysilane is particularly soluble and fusible and is characterized by significant product signals in special chemical shifts in <sup>29</sup>Si NMR spectra. The process for producing the halogenated polysilane is characterized by using a low hydrogen portion and an especially low power density regarding the plasma discharge, thereby allowing the production of a halogenated polysilane which is particularly soluble. |
申请公布号 |
MX2010013005(A) |
申请公布日期 |
2011.05.24 |
申请号 |
MX20100013005 |
申请日期 |
2009.05.27 |
申请人 |
SPAWNT PRIVATE S.A.R.L. |
发明人 |
CHRISTIAN BAUCH;SEYED-JAVAD MOHSSENI-ALA;RUMEN DELTSCHEW;GERD LIPPOLD;NORBERT AUNER |
分类号 |
B01J12/00;C01B33/107;H05H1/24 |
主分类号 |
B01J12/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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